Doped Elongated Semiconductors, Growing Such
• Semiconductors, Devices Including Such ....
U.S. S.N. 09/935/776
H00498.70154/TJO/DPM
2/43
Doped Elongated Semiconductors, Growing Such
Semiconductors, Devices Including Such ....
U.S.S.N. 09/935/776
H00498.701 54/TJO/DPM
3/43
r
reactant
reactant
w
cluster formation
nucleaction + growth
nanowire
v
Fig. 3
Diameter control concept
Silane CVD
IP
V
Fig. 4
Doped Elongated Semiconductors, Growing Such
Semiconductors, Devices Including Such ....
U.S.S.N. 09/935/776
H00498. 70 1 54/TJO/DPM
4/43
Doped Elongated Semiconductors, Growing Such
• Semiconductors, Devices Including Such .... ^^^^
U.S. S.N. 09/935/776
H00498.70 1 54/TJO/DPM
5/43
Doped Elongated Semiconductors, Growing Such
• Semiconductors- Devices Including Such ....
U.S.S.N. 09/935/776
H00498.70154/TJO/DPM
6/43
First layer
Fig. 7C
Second layer
Fig. 7D
Fig. 7E
Doped Elongated Semiconductors, Growing Such
Semiconductors, Devices Including Such ....
U.S.S.N. 09/935/776
H00498.701 54/TJO/DPM
l.O-i
b 0.5-
'x
to
CL
J. 0.0-
-0.5-
7/43
To ^05 O0 o!7
1.0
V(volts)
Fig. 8A
1.0H
0.5
0.0-
-0.5-
-1.0-
12345678
-0.1 -0.05 0.0
V(volts)
0.05
Fig. 8B
1.0-1
0.5
0.0-
-0.5-
-1.0
Fig. 8C
-1.0 -0.5 0.0 0.5
V(volts)
1.0
Doped Elongated Semiconductors, Growing Such
t i i i r
-1.0 -0.5 0.0 0.5 1.0
V(volts)
Fig. 9A
51 O0 05 W
V(volts)
Fig. 9B
Doped Elongated Semiconductors, urowing buch
Semiconductors. Devices Including Such ....
U.S.S.N. 09/935/776
H00498.70 1 54/TJO/DPM
9/43
-Vg <0
-Vg = 0
Fig. 10A
Vg < 0
Vg = 0
Fig. 10B
Doped Elongated Semiconductors. Growing Such
Semiconductors, Devices Including Such ....
U.S.S.N. 09/935/776
H00498.70 1 54/TJO/DPM
10/43
4.0-1
2.0-
0.0-
-2.0-
-4.0-
-0.01
-0.005
0.0
V(volts)
0.005 0.01
Fig. 11 A
0.5-
0.0-
-0.5-
-0.04 -0.02 O0 O02 O04
V(volts)
Fig. 11 B
Doped Elongaied Semiconductors, Growing Such
• Semiconductors, Devices Including Such ....
U.S.S.N. 09/935/776
H00498.70 1 54/TJO/DPM
11/43
Doped Elongated Semiconductors, wowing aucn
Semiconductors, Devices Including Such ....
U.S.S.N. 09/935/776
H00498.70 1 54/TJO/DPM
12/43
Fig. 13B
Doped Elongated Semiconductors, Growing Such
Semiconductors, Devices Including Such .
U.S.S.N. 09/935/776
H00498.701 54/TJO/DPM
13/43
I6-1
Diameter (nm)
Fig. 14A
25-,
20-
18 20 22 24
Diameter (nm)
Fig. 14B
Doped Elongated Semiconductors, Growing Such
Semiconductors, Devices Including Such ....
U.S.S.N. 09/935/776
HO0498.70 1 54/TJO/DPM
14/43
i r
10 12 14 16
Diameter (nm)
Fig. 14C
20-i
o
to
o
40 60 80
Diameter (nm)
Fig. 14D
Doped Elongated Semiconductors, Growing Such
Semiconductors, Devices Including Such ....
U.S.S.N. 09/935/776
H00498.70154/TJO/DPM
15/43
Fig. 15
Fig. 16A
Fig. 16C
Doped Elongated Semiconductors, Growing Such
Semiconductors, Devices Including Such ....
U.S.S.R 09/935/776
H00498.70 1 54/TJO/DPM
17/43
Doped Elongated Semiconductors, Growing Such
Semiconductors, Devices Including Such .... A
U.S.S.N. 09/935/776 ■
H00498.70 1 54/TJO/DPM ^
18/43
Fig. 17C
Fig. 17D
Doped Elongated Semiconductors, Growing Such
Fig. 18B
Fig. 18C
Doped Elongated Semiconductors, Growing Such
Semiconductors, Devices Including Such ....
U.S.S.N. 09/935/776
H00498.70 1 54/TJO/DPM
20/43
r
(GaN) vapor
900 °C
(Ga,N) vapor
900 °C
cool
(Fe,Ga,N) liquid
nanocluster from
laser ablation
nucleation
of nanowire
Fig. 19
nanowire nanocluster solidifies;
growth growth ends
J
Doped Elongated Semiconductors, Growing Such
Fig. 20A
(002)
~i 1 1 1 1 r
35 40 45 50 55 60
20 (degrees)
Fig. 20B
Doped Elongated Semiconductors, Urowmg bucn
Semiconductors, Devices Including Such ....
U.S.S.N. 09/935/776
H00498.70 1 54/TJO/DPM
22/43
Fig. 21B
Doped Elongated Semiconductors, Growing Such
Semiconductors, Devices Including Such ....
U.S.S.N. 09/935/776
H00498.70 1 54/TJO/DPM
0
23/43
^08 -6.4 O0 04 08
Voltage (V)
Fig. 22B
^08 -0.4 o!o 04 08
Voltage (V)
Fig. 22C
Doped Elongated Semiconductors, Growing Such
Semiconductors, Devices Including Such ....
U.S.S.R 09/935/776
H00498.70 1 54/TJO/DPM
24/43
Voltage (V)
Fig. 23B
Doped Elongated Semiconductors, Growing Such
Voltage (V)
Fig. 23C
-4-3-2-101234
Voltage (V)
Fig. 23D
Doped Elongated Semiconductors, Growing Such
Semiconductors, Devices Including Such ....
U.S.S.N. 09/935/776
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26/43
Fig. 24A
1 i i i r
1.6 2.0 2.4 2.8 3.2
Forward bias (V)
Fig. 24B
Doped Elongated Semiconductors, Growing Such
700 800 900
Wavelength (nm)
Fig. 24C
600 700 800
Wavelength (nm)
Fig. 24D
Doped Elongated Semiconductors, Growing Such
Fig. 25A
1200-
800-
400-
o\
-4 -2 0 2 4
Bias (V)
Fig. 25B
200-
350 400 450 500
Wavelength (nm)
Fig. 25C
Doped Elongated Semiconductors, Growing Such
Semiconductors, Devices Including Such ....
U.S.S.N. 09/935/776
H00498.70 1 54/TJO/DPM
29/43
r
Fig. 26D
Doped Elongated Semiconductors, Growing Such
Semiconductors, Devices Including Such ....
U.S.S.N. 09/935/776
H00498.70 1 54/TJO/DPM
30/43
Voltage (V)
Fig. 27B
Voltage (V)
Fig. 27C
Doped Elongated Semiconductors, Growing Such
Semiconductors, Devices Including Such ....
U.S.S.N. 09/935/776
H00498.70 1 54/TJO/DPM
31/43
40-
20-
0-
-20
-40H
l'.O -0.5 o!o 05 V0
Voltage (V)
Fig. 27D
p-type
n-type
Forward bias
Fig. 27E
p-type n-type
?/////////,
Reverse bias
Fig. 27F
Doped Elongated Semiconductors, Growing Such
Semiconductors, Devices Including Such ....
U.S.S.N. 09/935/776
H00498.70 1 54/TJO/DPM
32/43
Fig. 28B
Doped Elongated Semiconductors. Growing Such
Semiconductors, Devices Including Such ....
U.S.S.N. 09/935/776
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0.5-
°°-H 1 1 1 r
-4 -2 0 2 4
Voltage C-B (V)
Fig. 28D
Doped Elongated Semiconductors, Growing Such
Semiconductors. Devices Including Such ....
U.S.S.N. 09/935/776
H00498.70 1 54/TJO/DPM
34/43
Doped Elonaated Semiconductors, Growing Such
• Semiconductors, Devices Including Such ....
U.S.S.N. 09/935/776
H00498.70154/TJO/DPM
35/43
Doped Elongated Semiconductors, Growing Such
Semiconductors, Devices Including Such ....
U.S.S.N. 09/935/776
H0O498.70 1 54/TJO/DPM
36/43
Doped Elongated Semiconductors, Growing Such
Semiconductors, Devices Including Such ....
U.S.S.N. 09/935/776
H00498.701 54/TJO/DPM
37/43
Doped Elongated Semiconductors. Growing Such
Semiconductors, Devices Including Such ....
U.S.S.N. 09/935/776
H00498.70 1 54/TJO/DPM
38/43
Fig. 31 A
Fig. 31 B
Doped Elongated Semiconductors, Growing Such
• Semiconductors, Devices Including Such
U.S.S.N. 09/935/776
H00498.70 1 54/TJO/DPM
39/43
16-
CD
"g 12-
S>
o 10-
S 8-
A
A
-20 0 20
Angle (deg.)
n 1 r
6 7 8
Flow rate (mm/s)
Fig. 31 C
10
250-
8r 200H
o
z 150H
I 100H
o
50-
0-
i
0
10 20 30
Time (min.)
Fig. 31 D
40
Doped Elongated Semiconductors, Growing Such
Semiconductors, Devices Including Such
U.S.S.N. 09/935/776
H00498.70 1 54/TJO/DPM
40/43
Fig. 32A
Fig. 32B
Doped Elongated Semiconductors, Growing Such
Semiconductors, Devices Including Such ....
U.S.S.N. 09/935/776
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Fig. 32C
Fig. 32D
Doped Elongated Semiconductors, Growing Such
Semiconductors, Devices Including Such ....
U.S.S.N. 09/935/776
H00498.70 1 54/TJO/DPM
42/43
Fig. 33B
Fig. 33C
•
Doped Elongated Semiconductors, Growing Such
Semiconductors, Devices Including Such ....
U.S.S.N. 09/935/776
H00498.70 1 54/TJO/DPM
43/43
Fig. 33D
Voltage (V)
Fig. 33E